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101 impurity
1) (легуюча) домішка 2) забруднення, небажана домішка - atomic impurity
- background impurity
- base impurity
- channel-stop impurity
- compensated impurity
- compensating impurity
- conductivity -type- determining impurity
- conductivity determining impurity
- contaminating impurity
- deep-level impurity
- deep-lying impurity
- diffusant impurity
- diffusing impurity
- donor impurity
- dopant impurity
- doping impurity
- emitter impurity
- free carrier impurity
- group V impurity
- implanted impurity
- interstitial impurity
- ion implanted impurity
- lifetime killing impurity
- lifetime shortening impurity
- migrating impurity
- molecular impurity
- n-type impurity
- polarized impurity
- p-type impurity
- shallow-level impurity
- shallow-lying impurity
- spin-on impurity
- stoichiometric impurity
- substitutional impurity
- transition metal impurity
- trap impurity
- ultratrace impurity -
102 input
1) вхід; ввід 2) вхідний пристрій - bipolar input
- digital input
- edge sensitive input
- emitter-follower input
- FET input
- illegal input
- interactive input
- inverting input
- legal input
- multiplexed inputs
- non-inverting input
- Schottky-clamped input
- sensitive input gate
- wave form input -
103 mask
1. ім.1) фотошаблон; шаблон; (вільна) маска; трафарет2) маска, маскуючий шар2. дієсл. маскувати - artwork mask
- base-region mask
- base mask
- base-resistor mask
- bimetal mask
- blocking mask
- chrome mask
- collector mask
- composite mask
- contact-area mask
- contact mask
- contact-print additional mask
- custom mask
- deep UV mask
- delineation mask
- deposition mask
- diffusion mask
- doping mask
- dry film solder mask
- E-beam mask
- E-chrome mask
- electron-beam generated mask
- emitter mask
- emulsion mask
- etch ing mask
- etch mask
- etch-resistantmask
- etch-resistmask
- evaporation mask
- exposure mask
- fault injection mask
- faultless mask
- field-oxidemask
- fieldmask
- fine-line mask
- gold mask
- grid mask
- hard-surface mask
- high-contrast X-ray mask
- high-flatness mask
- high-transmission X-ray mask
- IC mask
- in situ mask
- insulator mask
- interconnection mask
- ion-beam stencil mask
- ion-implantation mask
- iron-oxide mask
- isolation mask
- layered mask
- lithographic mask
- master mask
- metal mask
- metal etched mask
- metallization etching mask
- metal-on-glass mask
- metal-on-polymer mask
- moving mask
- multi-pinhole mask
- native охide mask
- negative mask
- nonerodible mask
- offset mask
- optical mask
- optical gate mask
- overlaid mask
- oxidation mask
- oxygen-impermeable mask
- pattern mask
- pattern transfer mask
- photolithographic mask
- photoresist mask
- plating mask
- production mask
- programmingmask
- programmask
- projection mask
- p-well mask
- quartz mask
- refractory mask
- resistor-body mask
- reticle mask
- self-aligned mask
- sputter mask
- stencil mask
- step-and-repeat mask
- thick-film screen mask
- thin-film mask
- trench mask
- vacuum-deposition mask
- work mask
- X-ray lithography mask
- X-ray mask
- 1x mask
- 1:1 mask -
104 memory
пам’ять; запам’ятовуючий пристрій, ЗП - add-on memory
- array memory
- AS memory
- associate memory
- auxiliary memory
- backing memory
- beam-addressed memory
- bipolar memory
- block-oriented memory
- bucket-brigade memory
- buffer memory
- byte-wide random-access memory
- chalcogenide memory
- charge-coupled device memory
- charge-coupled memory
- charge packed memory
- charge-pumping memory
- CMOS/SOS memory
- content-addressable memory
- contiguous-disk bubble memory
- control memory
- cross-tie memory
- cryoelectronic memory
- cryogenic memory
- cryotron memory
- current-асcess magnetic-bubble memory
- destructive memory
- direct addressable memory
- dynamic memory
- electrically-alterable read-only memory
- electrically-erasable memory
- electronic-beam addressable memory
- emitter-coupled logic compatible memory
- erasable programmable readonly memory
- external memory
- factory-programmable read-only memory
- fast memory
- field-programmable read-only memory
- fixed memory
- fractional memory
- full wafer memory
- fusible-link programmable readonly memory
- general-purpose memory
- high-density memory
- high-speed memory
- IC memory
- I2L memory
- laser-programmed memory
- line-addressable random-access memory
- magnetic-bubble memory
- magnetic-film memory
- magnetooptic memory
- magnetoresistive random-асcess memoryies MRAMS
- magnetoresistive random-асcess memoryies
- mask-programmed memory
- mass-storagememory
- massmemory
- matrix memory
- microprogram memory
- molecular memory
- moving-domain memory
- MTL memory
- multichip memory
- multilevel memory
- nano memory
- nondestructive memory
- nonvolatile memory
- object-oriented memory
- off-chip memory
- on-chip memory
- one-transistor memory
- optical memory
- ovonic memory
- permanent memory
- polymer memory
- power-down memory
- programmable read-only memory
- pseudostatic memory
- random access memory
- read-mostly memory
- read-only memory
- registered programmable readonly memory
- reprogrammable memory
- Schottky programmable readonly memory
- scratch-pad memory
- self-refreshing memory
- semiconductor memory
- semipermanent memory
- solid-state memory
- stack memory
- static memory
- static-induction transistor memory
- superconductor memory
- supercurrent memory
- superdense memory
- superhigh-speed memory
- three-dimensional memory
- ultradense memory
- ultraviolet erasable memory
- VLSI memory
- volatile memory
- zeropower memory -
105 microprocessor
мікропроцесор (див. т-ж processor) - catalogue microprocessor
- CMOS-on-sapphire microprocessor
- complementary MOS microprocessor
- core microprocessor
- custom-designed microprocessor
- dedicated microprocessor
- emitter-coupled logic microprocessor
- functional partitioning microprocessor
- high-end microprocessor
- Josephson microprocessor
- low-end microprocessor
- mid-range microprocessor
- multichip microprocessor
- one-chip microprocessor
- printed-circuit board microprocessor
- single-chip microprocessor
- slice microprocessor
- very low-end microprocessorEnglish-Ukrainian dictionary of microelectronics > microprocessor
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106 opening
1) вікно, отвір (в маскуючому шарі) (див. т-ж window) 2) розкриття (вікна в шарі оксиду) 3) розрив; розмикання (електричного ланцюга) - diffusion-mask opening
- emitter-diffusion opening
- mask opening
- via opening
- window opening -
107 oxide
1) оксид, оксид 2) діоксид кремнію, SiO2- Al aluminum oxide- Al oxide
- antimonous oxide
- antimony oxide
- arsenic oxide
- arsenous oxide
- beryllium oxide
- boric oxide
- boron oxide
- boron-implanted oxide
- buried oxide
- capping oxide
- channel oxide
- chemical vapor deposited oxide
- crossover oxide
- doped oxide
- electron-beam evaporated oxide
- emitter reach-through oxide
- evaporated oxide
- ferric oxide
- ferrous oxide
- field oxide
- gate oxide
- implanted oxide
- insulation oxide
- interfacial oxide
- iron oxide
- lead-strontium-copper oxide
- low-temperature oxide LTO
- low-temperature oxide
- magnesium oxide
- maskingoxide
- maskoxide
- MOS oxide
- multilevel oxide
- nitric oxide
- nitrided oxide
- nitrous oxide
- phosphorus doped oxide
- planar oxide
- poly oxide
- pyrolytic oxide
- rare-earth oxide
- recessed oxide
- refractory oxide
- screening oxide
- screen oxide
- semiconducting oxide
- semiconductor oxide
- semirecessed oxide
- shallow oxide
- silicon oxide
- stepped oxide
- stress-relief oxide
- thermally grown oxide
- thick oxide
- thin oxide
- tin oxide
- tunnel oxide -
108 pattern
1. ім.1) малюнок; зображення; образ; рельєф2) конфігурація, форма2. дієсл. формувати малюнок; формувати зображення; формувати рельєф; структурувати - chip pattern
- circuit pattern
- computer-generated pattern
- conductive pattern
- conductor pattern
- contact pattern
- contiguous-disk propagation pattern
- customized metallization pattern
- discretionary wiring pattern
- dislocation pattern
- domain pattern
- dopant pattern
- electron-beam pattern
- electron diffraction pattern
- emitter pattern
- error-free layout pattern
- etchedpattern
- etchpattern
- fine-line pattern
- fine-linewidth pattern
- fixed-interconnection pattern
- gate pattern
- geometric pattern
- growth pattern
- high-aspect ratio pattern
- insulation pattern
- integrated-circuit pattern
- interconnection mask pattern
- layout pattern
- lead pattern
- mask pattern
- masked реrmalloy pattern
- masking pattern
- master pattern
- measurement pattern
- metal-finger pattern
- multiple pattern
- optical pattern
- oxide pattern
- permalloy propagation pattern
- photographic emulsion-maskpattern
- photographic emulsionpattern
- photoresist film pattern
- photoresist pattern
- photoresist mask pattern
- process evaluation and control pattern
- programmed-interconnection pattern
- regular pattern
- repetitive pattern
- reticle pattern
- routing pattern
- shifting test pattern
- silicon pattern
- step coverage pattern
- striation pattern
- subisolation pattern
- sunken охide pattern
- surface relief pattern
- test pattern
- thick-film pattern
- thin-film pattern
- transistor pattern
- wafer pattern
- wiring pattern -
109 port
1) вхід; вихід; контакт 2) отвір 3) порт - multifunction port -
110 process
1. ім.1) процес; (технологічний) метод, спосіб2) технологія (див. т-ж technique, technology)3) (технологічна) обробка; технологічна операція2. дієсл. обробляти; проводити технологічну операцію - all-ion-implant process
- all-planar process
- Auger process
- batch process
- BH bias and hardness process
- BH process
- bonding process
- BOX process
- bulk CMOS process
- bumping process
- chip-on-board process
- closed CMOS process
- CMOS-on-sapphire process
- composite сеll logic process
- contact process
- conventional process
- deep охide isolation process
- DIFET process
- diffused eutectic aluminum process
- direct synthesis and crystal pull process
- double-diffused process
- double ion-implanted process
- double-layer polysilicon gate MOS process
- double-layer polysilicon gate process
- epitaxial deposition process
- epitaxial process
- epitaxial growth process
- flip-over process
- floating-gate silicon process
- front-end process
- gold-doped process
- guard-banded CMOS process
- heterogeneous process
- high-voltage process
- HMOS process
- imaging process
- implantation process
- in-house process
- interconnection process
- inverted meniscus process
- ion plating process
- isoplanar -S, -Z, -2 process
- isoplanar process
- junction-isolated process
- laser-recrystallized process
- lithographic process
- low-pressure process
- low VT process
- lost wafer process
- major process
- masking process
- master slice process
- mesa-isolation process
- metal-gate MOS process
- metal-gate process
- microbipolar LSI process
- micrometer-dimension process
- mid-film process
- Minimod process
- Mo-gate MOS process
- Mo-gate process
- nitride process
- nitrideless process
- NSA process
- oxide-film isolation process
- oxide isolated process
- oxygen refilling process
- patterning process
- phosphorous buried-emitter process
- photoablative process
- photolithography process
- photoresist process
- planar oxidation process
- Planox process
- plasma etch process
- Poly I process
- Poly II process
- Poly 5 process
- poly-oxide process
- Poly-Si process
- polysilicon-gate process
- poly-squared MOS process
- proprietary process
- PSA bipolar process
- PSA process
- refractory metal MOS process
- refractory metal process
- sacrificial охide process
- sapphire dielectric isolation process
- scaled Poly 5 process
- screen-and-fire process
- selective field-охidation process
- self-aligned gate process
- self-aligned process
- self-registered gate process
- self-registered process
- semi-additive process
- semiconductor-thermoplastic-dielectric process
- semicustom process
- shadow masking process
- silk-screen process
- single poly process
- SMOS process
- SOS/CMOS process
- stacked fuse bipolar process
- Stalicide process
- step-and-repeat process
- subtractive-fabrication process
- surface process
- Telemos process
- thermal process
- thermally асtivated surface process
- thermal-охidation process
- three-mask process
- triple-diffused process
- triply-poly process
- twin-tub process
- twin-well process
- V-groove MOS process
- V-groove process
- wet process
- 3-D process -
111 ratio
1) відношення; співвідношення 2) коефіцієнт - aspect ratio vertical
- beam pressure ratio
- common-base forward-current transfer ratio
- common-emitter forward-current transfer ratio
- common-mode rejection ratio
- concentration ratio
- cost-реrformance ratio
- coupling ratio
- damping ratio
- doping ratio
- etching ratio
- etch ratio
- expansion ratio
- injection ratio
- mixture ratio
- multiplication ratio
- on-off current ratio
- oversampling ratio
- Poisson’s ratio
- ripple ratio
- scaling ratio
- shrinkage ratio
- signal-to-noise ratio
- speed/power ratio
- stoichiometric ratio
- TMG/TEG ratio
- width-to-length W/L ratio
- width-to-length ratio -
112 reach-through
English-Ukrainian dictionary of microelectronics > reach-through
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113 stripe
-
114 voltage
напруга, різниця потенціалів - applied voltage
- avalanche breakdown voltage
- barrier voltage
- base voltage
- bias voltage
- blocking voltage
- collector-base voltage
- collector-substrate voltage
- contact voltage
- control voltage
- cutoff voltage
- dc voltage
- dielectric breakdown voltage
- disruptive voltage
- driving voltage
- emitter-base voltage
- field-inversion voltage
- forward voltage
- Hall voltage
- impressed voltage
- inverse voltage
- junction voltage
- logical one voltage
- logical zero voltage
- Lorentz voltage
- offset voltage
- operating voltage
- pinch-off voltage
- punched-through voltage
- reference voltage
- reverse voltage
- reverse-breakdown voltage
- rupture voltage
- saturation voltage
- source voltage
- supply voltage
- threshold voltage
- turn-off voltage
- turn-on voltage -
115 window
вікно, отвір (в маскуючому шарі) - base diffusion window
- collector contact window
- contact window
- doping mask window
- emitter contact window
- gate window
- isolation-diffusion window
- n-p-n base window
- oxide window
- p-n-p base window
- reach-through window
- via window
- write-erase window -
116 identification
1. n1) розпізнавання, ідентифікація2) індекс, код3) розмітка; позначення2. a◊•- aerodrome identification - aircraft identification - aircraft stand identification - beam identification - correct identification of the target - decoy identification - emitter location identification - flight occurrence identification - flight report identification - friend/foe identification - friend-or-foe identification - ground-objects identification - in-flight target identification - identification of signals - identification of snow cover - infrared identification - message identification - object identification - positive identification - radar blip identification - radar identification - radar target identification - radio identification - source identification - squawk identification - symbol identification - target identification - transmission identification - visual identificationEnglish-Ukrainian dictionary of aviation terms > identification
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117 locator
См. также в других словарях:
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Emitter-Basis-Übergang — emiterio sandūra statusas T sritis automatika atitikmenys: angl. emitter junction; emitter base junction vok. Emitter Basis Übergang, m; Emitterübergang, m rus. переход эмиттер база, m; эмиттерный переход, m pranc. jonction émetteur base, f … Automatikos terminų žodynas
emitter junction — emiterio sandūra statusas T sritis automatika atitikmenys: angl. emitter junction; emitter base junction vok. Emitter Basis Übergang, m; Emitterübergang, m rus. переход эмиттер база, m; эмиттерный переход, m pranc. jonction émetteur base, f … Automatikos terminų žodynas