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1 plasma vapor deposition process
< srfc> (application of very thin layers; e.g. on wafers) ■ PVD-Verfahren n ; Aufdampfen im Vakuum n ; Vakuumaufdampfen n ; Bedampfen n ; Vakuumaufdampfverfahren nEnglish-german technical dictionary > plasma vapor deposition process
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2 zinc vapor deposition process
(ZVD) < srfc> ■ Zinkaufdampfverfahren nEnglish-german technical dictionary > zinc vapor deposition process
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Chemical vapor deposition — DC plasma (violet) enhances the growth of carbon nanotubes in this laboratory scale PECVD apparatus. Chemical vapor deposition (CVD) is a chemical process used to produce high purity, high performance solid materials. The process is often used in … Wikipedia
Combustion chemical vapor deposition — (CCVD) is a chemical process by which thin film coatings are deposited onto substrates in the open atmosphere. Contents 1 History 2 Principles and procedure 3 Remote combustion chemical v … Wikipedia
Metalorganic chemical vapor deposition — (MOCVD) is a chemical vapor deposition process that uses metalorganic source gases. For instance, MOCVD may use tantalum ethoxide (Ta(OC 2H 5) 5), to create tantalum pentoxide (Ta 2O 5), or Tetrakis Dimethyl Amino Titanium(IV) (TDMAT) to create… … Wikipedia
Electron beam physical vapor deposition — or EBPVD is a form of physical vapor deposition in which a target anode is bombarded with an electron beam given off by a charged tungsten filament under high vacuum. The electron beam causes atoms from the target to transform into the gaseous… … Wikipedia
Hybrid Physical-Chemical Vapor Deposition — (HPCVD) is a thin film deposition technique that combines physical vapor deposition (PVD) with chemical vapor deposition (CVD). For the instance of magnesium diboride (MgB2) thin film growth, HPCVD process uses diborane (B2H6) as the boron… … Wikipedia
Chemical vapor deposition of ruthenium — is a method to deposit thin layers of ruthenium on substrate by Chemical vapor deposition (CVD). A unique challenge arises in trying to grow impurity free films of a catalyst in Chemical vapor deposition (CVD). Ruthenium metal activates C H and C … Wikipedia
Physical vapor deposition — (PVD) is a variety of vacuum deposition and is a general term used to describe any of a variety of methods to deposit thin films by the condensation of a vaporized form of the material onto various surfaces (e.g., onto semiconductor wafers). The… … Wikipedia
Chemical vapor deposition — Unter dem Begriff chemische Gasphasenabscheidung (englisch chemical vapor deposition, CVD) versteht man eine Gruppe von Beschichtungsverfahren, welche unter anderem bei der Herstellung von mikroelektronischen Bauelementen eingesetzt werden.… … Deutsch Wikipedia
Plasma-enhanced chemical vapor deposition — PECVD machine at LAAS technological facility in Toulouse, France. Plasma enhanced chemical vapor deposition (PECVD) is a process used to deposit thin films from a gas state (vapor) to a solid state on a substrate. Chemical reactions are involved… … Wikipedia
Chemical vapor deposition of diamond — Colorless gem cut from diamond grown by chemical vapor deposition Chemical vapor deposition of diamond or CVD is a method of producing synthetic diamond by creating the circumstances necessary for carbon atoms in a gas to settle on a substrate in … Wikipedia
Deposition — or Depose may refer to: Deposition (law), taking testimony outside of court Deposition (chemistry), molecules settling out of a solution Thin film deposition, any technique for depositing a thin film of material onto a substrate or onto… … Wikipedia