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scanning+electron-beam+lithography

См. также в других словарях:

  • scanning electron-beam lithography — skleistinė elektronpluoštė litografija statusas T sritis radioelektronika atitikmenys: angl. scanning electron beam lithography; write electron beam lithography vok. Elektronenstrahlschreibenlithografie, f; Rasterelektronenstrahlithografie, f rus …   Radioelektronikos terminų žodynas

  • Electron beam lithography — (often abbreviated as e beam lithography) is the practice of scanning a beam of electrons in a patterned fashion across a surface covered with a film (called the resist),cite book |last= McCord |first=M. A. |coauthors=M. J. Rooks |title=… …   Wikipedia

  • write electron-beam lithography — skleistinė elektronpluoštė litografija statusas T sritis radioelektronika atitikmenys: angl. scanning electron beam lithography; write electron beam lithography vok. Elektronenstrahlschreibenlithografie, f; Rasterelektronenstrahlithografie, f rus …   Radioelektronikos terminų žodynas

  • Electron — For other uses, see Electron (disambiguation). Electron Experiments with a Crookes tube first demonstrated the particle nature of electrons. In this illustration, the profile of the cross shaped target is projected against the tube face at right… …   Wikipedia

  • Scanning tunneling microscope — Image of reconstruction on a clean Gold(100) surface …   Wikipedia

  • Lithography — Charles Marion Russell s The Custer Fight (1903). Note the range of tones, fading toward the edges …   Wikipedia

  • Électron — Traduction à relire Electron → …   Wikipédia en Français

  • Maskless lithography — In maskless lithography, the radiation that is used to expose a photosensitive emulsion (or photoresist) is not projected from, or transmitted through, a photomask.[1] Instead, most commonly, the radiation is focused to a narrow beam. The beam is …   Wikipedia

  • Interference lithography — (or holographic lithography) is a technique for patterning regular arrays of fine features, without the use of complex optical systems or photomasks. Basic principleThe basic principle is the same as in interferometry or holography. An… …   Wikipedia

  • Field electron emission — It is requested that a diagram or diagrams be included in this article to improve its quality. For more information, refer to discussion on this page and/or the listing at Wikipedia:Requested images. Field emission (FE) (also known as field… …   Wikipedia

  • Nanoimprint lithography — is a method of fabricating nanometer scale patterns. It is a simple nanolithography process with low cost, high throughput and high resolution. It creates patterns by mechanical deformation of imprint resist and subsequent processes. The imprint… …   Wikipedia

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