lithography system

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• Lithography — Charles Marion Russell s The Custer Fight (1903). Note the range of tones, fading toward the edges …   Wikipedia

• Electron beam lithography — (often abbreviated as e beam lithography) is the practice of scanning a beam of electrons in a patterned fashion across a surface covered with a film (called the resist),cite book |last= McCord |first=M. A. |coauthors=M. J. Rooks |title=… …   Wikipedia

• Computational lithography — (also known as computational scaling) is the set of mathematical and algorithmic approaches designed to improve the resolution attainable through photolithography. Computational lithography has come to the forefront of photolithography in 2008 as …   Wikipedia

• Contact lithography — Contact lithography, also known as contact printing, is a form of photolithography whereby the image to be printed is obtained by illumination of a photomask in direct contact with a substrate coated with an imaging photoresist layer. Contents 1… …   Wikipedia

• Multiphoton lithography — (also known as direct laser lithography or direct laser writing) of polymer templates has been known for years by the photonic crystal community. Similar to standard photolithography techniques, structuring is accomplished by illuminating… …   Wikipedia

• Monotype System — The Monotype system is a set of two machines, the Monotype keyboard and the Monotype caster, which are used to typeset printed matter. A Monotype operator enters text on a Monotype keyboard, on which characters are arranged in the QWERTY… …   Wikipedia

• Integrated nanoliter system — In nanobiotechnology, an integrated nanoliter system is a device that automates a biological process using fluids on the nanoliter scale. Integrated nanoliter systems may be used for purifying or separating biomolecules. Integrated nanoliter… …   Wikipedia

• Nanoelectromechanical system — Part of a series of articles on Nanoelectronics Single molecule electronics …   Wikipedia

• Double patterning — is a class of technologies developed for photolithography to enhance the feature density. For the semiconductor industry, double patterning is the only lithography technique to be used for the 32 nm and 22 nm half pitch nodes in 2008 2009 and… …   Wikipedia

• Schrägbeleuchtung — (englisch off axis illumination) – seltener Schrägbelichtung oder außeraxiale Belichtung genannt – bezeichnet in der Halbleitertechnik ein fortgeschrittenes Belichtungsverfahren bei der fotolithografischen Strukturierung. Es bietet die… …   Deutsch Wikipedia

• Security hologram — 5000/10000 notes, etc. They are also used in credit and bank cards as well as quality products.Holograms are classified into different types with reference to the degree of level of optical security incorporated in them during the process of… …   Wikipedia