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1 excimer laser lithography
літографія з ексимерним лазером як джерело, ексимерна лазерна літографіяEnglish-Ukrainian dictionary of microelectronics > excimer laser lithography
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2 lithography
(мікро) літографія. Процес перенесення малюнка на поверхню пластини за допомогою світлового випромінювання (photolithography), потоку електронів або рентгенівського випромінювання (X-ray lithography) - charged-particle lithography
- contact lithography
- contactless lithography
- contrast-enhanced lithography
- deep-UV lithography
- direct growth lithography
- direct-write electron-beam lithography
- dot lithography
- dual-surface lithography
- electron-beam lithography
- electron lithography
- excimer laser lithography
- fine-line lithography
- focused ion-beam lithography
- full-wafer lithography
- bard-contact lithography
- high-resolution lithography
- high-voltage EB lithography
- holographic lithography
- hybrid lithography
- i-line lithography
- ion-beam lithography
- laser-basedlithography
- laserlithography
- lift-off lithography
- mask lithography
- maskless lithography
- micrometer micron lithography
- micron lithography
- molecular-level lithography
- optical lithography
- positive-resist projection lithography
- precise registration lithography
- projection lithography
- proximity lithography
- raster-scan electron-beam lithography
- resistless lithography
- scaled-down lithography
- scanning electron-beam lithography
- scanning ion-beam lithography
- self-aligned dual-surface lithography
- soft lithography
- soft-contact lithography
- step-and-repeat lithography
- step-on-wafer lithography
- stepper lithography
- submicron lithography
- synchrotron-radiationlithography
- synchrotronlithography
- ultraviolet lithography
- vector-scan electron-beam lithography
- wafer lithography
- wafer-stepper lithography
- write e-beam lithography
- X-ray lithographyEnglish-Ukrainian dictionary of microelectronics > lithography
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3 laser(-based)lithography
лазерна літографіяEnglish-Ukrainian dictionary of microelectronics > laser(-based)lithography
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4 laser(-based)lithography
лазерна літографіяEnglish-Ukrainian dictionary of microelectronics > laser(-based)lithography
См. также в других словарях:
laser lithography — lazerinė litografija statusas T sritis radioelektronika atitikmenys: angl. laser lithography vok. Laserlithografie, f rus. лазерная литография, f pranc. lithographie laser, f … Radioelektronikos terminų žodynas
Láser excimer — Láser de excímeros, empleado en cirugía oftalmológica para tratamientos LASIK. Equipamiento de la marca Carl Zeiss. El láser de excímeros, láser excimer (calco del inglés) o láser exciplex, es un tipo de láser ultravioleta utilizado… … Wikipedia Español
Láser de fluoruro de kriptón — Este artículo trata sobre el láser excímero. Para obtener información general acerca del compuesto químico Difluoruro de kriptón, véase Difluoruro de kriptón. Este artículo trata sobre el láser excímero. Para obtener información general acerca… … Wikipedia Español
Lithography — Charles Marion Russell s The Custer Fight (1903). Note the range of tones, fading toward the edges … Wikipedia
Laser printer — HP LaserJet 4200 series printer, installed atop high capacity paper feeder … Wikipedia
Multiphoton lithography — (also known as direct laser lithography or direct laser writing) of polymer templates has been known for years by the photonic crystal community. Similar to standard photolithography techniques, structuring is accomplished by illuminating… … Wikipedia
lithographie laser — lazerinė litografija statusas T sritis radioelektronika atitikmenys: angl. laser lithography vok. Laserlithografie, f rus. лазерная литография, f pranc. lithographie laser, f … Radioelektronikos terminų žodynas
Nanoimprint lithography — is a method of fabricating nanometer scale patterns. It is a simple nanolithography process with low cost, high throughput and high resolution. It creates patterns by mechanical deformation of imprint resist and subsequent processes. The imprint… … Wikipedia
Maskless lithography — In maskless lithography, the radiation that is used to expose a photosensitive emulsion (or photoresist) is not projected from, or transmitted through, a photomask.[1] Instead, most commonly, the radiation is focused to a narrow beam. The beam is … Wikipedia
Extreme ultraviolet lithography — (also known as EUV or EUVL ) is a next generation lithography technology using the 13.5 nm EUV wavelength. EUVL opticsEUVL is a significant departure from the deep ultraviolet lithography used today. All matter absorbs EUV radiation. Hence, EUV… … Wikipedia
Interference lithography — (or holographic lithography) is a technique for patterning regular arrays of fine features, without the use of complex optical systems or photomasks. Basic principleThe basic principle is the same as in interferometry or holography. An… … Wikipedia