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21 mask
1. ім.1) фотошаблон; шаблон; (вільна) маска; трафарет2) маска, маскуючий шар2. дієсл. маскувати - artwork mask
- base-region mask
- base mask
- base-resistor mask
- bimetal mask
- blocking mask
- chrome mask
- collector mask
- composite mask
- contact-area mask
- contact mask
- contact-print additional mask
- custom mask
- deep UV mask
- delineation mask
- deposition mask
- diffusion mask
- doping mask
- dry film solder mask
- E-beam mask
- E-chrome mask
- electron-beam generated mask
- emitter mask
- emulsion mask
- etch ing mask
- etch mask
- etch-resistantmask
- etch-resistmask
- evaporation mask
- exposure mask
- fault injection mask
- faultless mask
- field-oxidemask
- fieldmask
- fine-line mask
- gold mask
- grid mask
- hard-surface mask
- high-contrast X-ray mask
- high-flatness mask
- high-transmission X-ray mask
- IC mask
- in situ mask
- insulator mask
- interconnection mask
- ion-beam stencil mask
- ion-implantation mask
- iron-oxide mask
- isolation mask
- layered mask
- lithographic mask
- master mask
- metal mask
- metal etched mask
- metallization etching mask
- metal-on-glass mask
- metal-on-polymer mask
- moving mask
- multi-pinhole mask
- native охide mask
- negative mask
- nonerodible mask
- offset mask
- optical mask
- optical gate mask
- overlaid mask
- oxidation mask
- oxygen-impermeable mask
- pattern mask
- pattern transfer mask
- photolithographic mask
- photoresist mask
- plating mask
- production mask
- programmingmask
- programmask
- projection mask
- p-well mask
- quartz mask
- refractory mask
- resistor-body mask
- reticle mask
- self-aligned mask
- sputter mask
- stencil mask
- step-and-repeat mask
- thick-film screen mask
- thin-film mask
- trench mask
- vacuum-deposition mask
- work mask
- X-ray lithography mask
- X-ray mask
- 1x mask
- 1:1 mask
- 1
- 2
См. также в других словарях:
ion etching — ion etching, a method of eroding materials such as metals, glass, polymers, and body tissue, atom by atom, by bombarding them with high energy ions, in order to reveal their smallest structural features … Useful english dictionary
ion etching — joninis ėsdinimas statusas T sritis radioelektronika atitikmenys: angl. ion etching vok. Ionenätzen, n rus. ионное травление, n pranc. décapage ionique, m … Radioelektronikos terminų žodynas
ion-etching chamber — joninio ėsdinimo kamera statusas T sritis radioelektronika atitikmenys: angl. ion etching chamber vok. Ionenätzkammer, f rus. камера для ионного травления, f pranc. chambre pour décapage ionique, f … Radioelektronikos terminų žodynas
Deep reactive-ion etching — (DRIE) is a highly anisotropic etch process used to create deep penetration, steep sided holes and trenches in wafers, with aspect ratios of 20:1 or more. It was developed for microelectromechanical systems (MEMS), which require these features,… … Wikipedia
Reactive-ion etching — (RIE) is an etching technology used in microfabrication. It uses chemically reactive plasma to remove material deposited on wafers. The plasma is generated under low pressure (vacuum) by an electromagnetic field. High energy ions from the plasma… … Wikipedia
Reactive-ion etching — Gravure ionique réactive La gravure ionique réactive ou gravure par ions réactifs très souvent appelée par son acronyme anglophone, RIE (pour Reactive Ion Etching), est une technique de gravure sèche des semi conducteurs. Il s agit d une… … Wikipédia en Français
Reactive Ion Etching — Gravure ionique réactive La gravure ionique réactive ou gravure par ions réactifs très souvent appelée par son acronyme anglophone, RIE (pour Reactive Ion Etching), est une technique de gravure sèche des semi conducteurs. Il s agit d une… … Wikipédia en Français
Deep Reactive Ion Etching — Reaktives Ionentiefenätzen (engl. Deep Reactive Ion Etching, DRIE), eine Weiterentwicklung des reaktiven Ionenätzen (RIE), ist ein hoch anisotroper Trockenätzprozess für die Herstellung von Mikrostrukuren in Silicium mit Aspektverhältnissen (das… … Deutsch Wikipedia
reactive ion etching — reaktyvusis joninis ėsdinimas statusas T sritis radioelektronika atitikmenys: angl. reactive ion etching; reactive ion milling vok. reaktives Ionenätzen, n rus. реактивное ионное травление, n pranc. décapage ionique réactif, m … Radioelektronikos terminų žodynas
diode ion etching — dvielektrodis joninis ėsdinimas statusas T sritis radioelektronika atitikmenys: angl. diode ion etching vok. Diodenätzen, n; Ionenstrahlätzen in einer Diodenätzanlage, n rus. двухэлектродное ионное травление, n pranc. décapage ionique à l… … Radioelektronikos terminų žodynas
high-frequency ion etching — aukštadažnis joninis ėsdinimas statusas T sritis radioelektronika atitikmenys: angl. high frequency ion etching vok. Hochfrequenzionenätzen, n rus. высокочастотное ионное травление, n pranc. gravure ionique à haute fréquence, f … Radioelektronikos terminų žodynas