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1 anisotropic etch
1) анізотропний травник2) анізотропне травленняEnglish-Ukrainian dictionary of microelectronics > anisotropic etch
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2 anisotropic etch propert/y
властивість анізотропного травникаEnglish-Ukrainian dictionary of microelectronics > anisotropic etch propert/y
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3 etch
1. ім.1) травник (див. тж etchant)2. дієсл. травити - to etch into
- to etch out
- acid etch
- anisotropic etch
- buffered etch
- buffered охide etch BOE
- buffered охide etch
- caustic etch
- chemical etch
- crystal-orientation dependent etch
- gaseousetch
- gasetch
- isotropic etch
- orientation dependent etch
- oxide etch
- photoresist-controlled etch
- planar plasma etch
- step etch
- stress relief etch
- trench etch
- V-groove etch
- wet etch -
4 propert/y
- bulk propert/yies
- doping propert/y
- extrinsic propert/yies
- intrinsic propert/yies
- transport propert/yEnglish-Ukrainian dictionary of microelectronics > propert/y
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5 etching
травлення (див. т-ж etch) - anisotropic etching
- anode etching
- batch etching
- blanket etching
- chemically assisted etching
- concentration dependent etching
- crystallographically sensitive etching
- deep reactive ion etching DRIE
- deep reactive ion etching
- differential etching
- digital etching
- diode ion etching
- diode etching
- dip etching
- directional etching
- dislocation etching
- dry process etching
- dry etching
- electron-beam induced etching
- excessive etching
- exciraer laser etching
- gas-phase plasma-assisted etching
- high-frequency ion etching
- hydrogen reactive ion etching
- ion etching
- ion-assisted plasma etching
- ion-beam induced etching
- isotropic etching
- jet etching
- laser-enhanced etching
- laser-induced pattern projection etching
- laser radical etching
- lateral etching
- lift-off etching
- light-induced etching
- low-pressure plasma etching
- low-pressure etching
- masked etching
- maskless etching
- maskless laser etching
- mesa etching
- microwave plasma etching
- microwave etching
- mild etching
- nonundercutting etching
- orientation-dependent etching
- oxygen gas plasma etching
- permeation etching
- photochemical etching
- photoelectrochemical etching
- photo-enhanced chemical dry etching
- photoexcited etching
- photo-initiated etching
- photoresist-masked etching
- plasma reactor etching
- plasma etching
- post etching
- preferential etching
- radical plasma etching
- radical etching
- radio-frequency plasma etching
- reactive ion etching
- regenerative etching
- resistless etching
- selective etching
- sharp etching
- sideways etching
- single-step laser etching
- spray etching
- sputter etching
- steady-state etching
- synchrotron radiation-assisted etching
- taper etching
- tetrode ion etching
- tetrode etching
- triode ion etching
- triode etching
- undercuttingetching
- undercutetching
- UV laser etching
- vacuum ultraviolet-assisted etching
- vertical etching
- VUV-assisted etching
- wet chemical etching
- wet etching
- zero-undercut etching
См. также в других словарях:
anisotropic etch property — anizotropinio ėsdiklio savybė statusas T sritis radioelektronika atitikmenys: angl. anisotropic etch property vok. Eigenschaft des anisotropen Ätzers, f rus. свойство анизотропного травителя, n pranc. propriété de décapant anisotrope, f … Radioelektronikos terminų žodynas
anisotropic etch profile — anizotropinio ėsdinimo profilis statusas T sritis radioelektronika atitikmenys: angl. anisotropic etch profile vok. anisotropes Ätzprofil, n rus. профиль анизотропного травления, m pranc. profil de décapage anisotrope, m … Radioelektronikos terminų žodynas
Etching (microfabrication) — Etching tanks used to perform Piranha, Hydrofluoric acid or RCA clean on 4 inch wafer batches at LAAS technological facility in Toulouse, France Etching is used in microfabrication to chemically remove layers from the surface of a wafer during… … Wikipedia
Isotropy — is uniformity in all orientations; it is derived from the Greek iso (equal) and tropos (direction). Precise definitions depend on the subject area. Exceptions, or inequalities, are frequently indicated by the prefix an, hence anisotropy.… … Wikipedia
Reactive-ion etching — (RIE) is an etching technology used in microfabrication. It uses chemically reactive plasma to remove material deposited on wafers. The plasma is generated under low pressure (vacuum) by an electromagnetic field. High energy ions from the plasma… … Wikipedia
Deep reactive-ion etching — (DRIE) is a highly anisotropic etch process used to create deep penetration, steep sided holes and trenches in wafers, with aspect ratios of 20:1 or more. It was developed for microelectromechanical systems (MEMS), which require these features,… … Wikipedia
Micro contact printing — Figure 1: PDMS master is created by patterning silicon, pouring and curing the PDMS, and peeling away from the substrate … Wikipedia
Eigenschaft des anisotropen Ätzers — anizotropinio ėsdiklio savybė statusas T sritis radioelektronika atitikmenys: angl. anisotropic etch property vok. Eigenschaft des anisotropen Ätzers, f rus. свойство анизотропного травителя, n pranc. propriété de décapant anisotrope, f … Radioelektronikos terminų žodynas
anizotropinio ėsdiklio savybė — statusas T sritis radioelektronika atitikmenys: angl. anisotropic etch property vok. Eigenschaft des anisotropen Ätzers, f rus. свойство анизотропного травителя, n pranc. propriété de décapant anisotrope, f … Radioelektronikos terminų žodynas
propriété de décapant anisotrope — anizotropinio ėsdiklio savybė statusas T sritis radioelektronika atitikmenys: angl. anisotropic etch property vok. Eigenschaft des anisotropen Ätzers, f rus. свойство анизотропного травителя, n pranc. propriété de décapant anisotrope, f … Radioelektronikos terminų žodynas
свойство анизотропного травителя — anizotropinio ėsdiklio savybė statusas T sritis radioelektronika atitikmenys: angl. anisotropic etch property vok. Eigenschaft des anisotropen Ätzers, f rus. свойство анизотропного травителя, n pranc. propriété de décapant anisotrope, f … Radioelektronikos terminų žodynas